Photomasks are becoming more complex at each node. In fact, masks are moving from traditional shapes to non-orthogonal patterns and complex shapes, such as curvilinear mask patterns. To measure ...

The new IM-6000 Series image-dimension measurement system features Pattern Registration and Pattern Search functions for simplified “place-and-press” measurement operation. It eliminates the need for ...

We present a cost-effective focus monitoring technique based on the illumination and the target co-optimization. An advanced immersion scanner can provide the freeform illumination that enables the ...